Electronic properties of Co and Ni silicides: a theoretical approach using extended Huckel method

Abstract

Calculations of electronic structure, total and projected density of states (DOS), crystal orbital overlap population (COOP), and average net charge, and also Mulliken population analysis, were performed to study electronic properties of Co and Ni silicides. Analysis of the energy bands depicts metallic behavior for both silicides. The projected DOS yields an indication that hybridization occurs for Co and Ni silicides. The hybridized band in CoSi2 is composed of Co d and p orbitals and Si p and s orbitals, while in NiSi2 the hybridized band is formed by Ni d and p orbitals with Si p orbitals. The fact that the Fermi energy crosses a small part of the DOS, as is the case of CoSi2 yields an indication of the different electronic properties of CoSi, when compared to NiSi2. The hybridization is stronger in CoSi, than in NiSi2. Mulliken population analysis provides an indication that a smaller charge distribution exists in NiSi2 when compared to CoSi2. This difference in charge distribution accounts for the different electronic behavior, in agreement with the DOS analysis. Moreover, COOP analysis provides an indication of the existence of covalent bonding between M and Si (M = Ni, Co), this being stronger in Co than in Ni silicides. Furthermore, the average net charge in both compounds yields an indication that there is a charge transfer from M towards Si. (C) 2004 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.