Ciencias,UNAM

Negative ion formation and motion in a mixture of CCl4 and Ar

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dc.contributor.author Yousif, FB
dc.contributor.author Martínez, H
dc.date.accessioned 2011-01-22T10:26:39Z
dc.date.available 2011-01-22T10:26:39Z
dc.date.issued 2004
dc.identifier.issn 1063-651X
dc.identifier.uri http://hdl.handle.net/11154/1589
dc.description.abstract This paper deals with the measurement of the mobility of negative ions in the mixtures of CCl4 with Ar with the CCl4 ratio up to 33.3%. The pulsed Townsend technique was employed to produce an integrated ionic avalanche over a range of the density-reduced electric field E/N for which ionization is either negligible or absent, and attachment processes are dominant, leading to the formation of mostly CCl4-. The E/N range of measurement was 1-50 Td (1 Td=10(-17) V cm(2)). Our measurements strongly suggest that attachment is the dominant process and only negative ions are formed. en_US
dc.language.iso en en_US
dc.title Negative ion formation and motion in a mixture of CCl4 and Ar en_US
dc.type Article en_US
dc.identifier.idprometeo 1807
dc.identifier.doi 10.1103/PhysRevE.69.046401
dc.source.novolpages 69(4)
dc.subject.wos Physics, Fluids & Plasmas
dc.subject.wos Physics, Mathematical
dc.description.index WoS: SCI, SSCI o AHCI
dc.relation.journal Physical Review E

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