| dc.contributor.author |
Elizondo-Villarreal, N |
|
| dc.contributor.author |
Farias, MH |
|
| dc.contributor.author |
Hirata, GA |
|
| dc.contributor.author |
Beamson, G |
|
| dc.contributor.author |
García-Mendez, M |
|
| dc.date.accessioned |
2011-01-22T10:26:51Z |
|
| dc.date.available |
2011-01-22T10:26:51Z |
|
| dc.date.issued |
2002 |
|
| dc.identifier.issn |
0218-625X |
|
| dc.identifier.uri |
http://hdl.handle.net/11154/3251 |
|
| dc.description.abstract |
By means of pulsed laser deposition we prepared Co-Ni/p-Si thin films upon a Si(100) substrates. Samples were thermally treated in vacuum in order to promote silicide formation. Rom X-ray photoelectron spectroscopy (XPS) analysis, we detected chemical shifts of the Co2p and Ni2p transitions, characteristic of silicide binding energy, at the respective ranges of 778.3-778.6 and 853.2-853.6 eV. By means of high resolution transmission electron microscopy (HRTEM) we identified some nanocrystalline regions belonging to CoSi2, Ni2Si and NiSi2 structures. We also appreciate that the resulting films are of a polycrystalline nature. |
en_US |
| dc.language.iso |
en |
en_US |
| dc.title |
Chemical and structural characterization of Co-Ni silicide thin films |
en_US |
| dc.type |
Article |
en_US |
| dc.identifier.idprometeo |
2131 |
|
| dc.source.novolpages |
9(40699):1661-1666 |
|
| dc.subject.wos |
Chemistry, Physical |
|
| dc.subject.wos |
Physics, Condensed Matter |
|
| dc.description.index |
WoS: SCI, SSCI o AHCI |
|
| dc.relation.journal |
Surface Review and Letters |
|